Developing equipment|Developing equipment | Official site of Ninomiya System Co., Ltd. in Nishinari-ku, OsakaDeveloping equipment|Developing equipment | Official site of Ninomiya System Co., Ltd. in Nishinari-ku, Osaka

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Developing equipment|Developing equipment

Developing equipment|Developing equipment

The realization of high-precision developing by ideal nozzle arrangement and oscillation.

To strike a balance between quality improvement and cost down by automatic preparative and chemicals control system The realization of high-precision L/S by the densification Available for FPC transport

Use

Development of dry film / solder resist / liquid resis

Specifications example

Equipment dimension (L×W×H)    :    6300 × 1475 × 1200 mm
Board size (effective width)    :    610mm
Process liquid    :    sodium carbonate
Transportation rate    :    0.06~6m/min
Pass line    :    
Operation system    :   

Line configuration example

Developing equipment|Developing equipment Line configuration example


*Equipment materials vary according to chemicals
*Please feel free to contact us for other special specifications

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