It supports an extra-large board
Etching of aluminums film on the glass board and stripping of photoresist with amine-based stripping liquid
Equipment dimension (L×W×H) ： 12356 × 2200 × 1500mm
Board size (effective width) ： 420mm
Process liquid ： Etching: phosphoric acid ? nitric acid ? acetic acid
Stripping: amine
Transportation rate ： 0.5～5m/min
Pass line ：
Operation system ：
*Equipment materials vary according to chemicals
*Please feel free to contact us for other special specifications
